Sputtering Targets

Boron Nitride Sputtering Target

CAS Number: 10043-11-5

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Tantalum Molybdenum (Ta-Mo) Alloy Sputtering Targets

CAS Number: 10043-11-5

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Iron Rhodium (Fe-Rh) Alloy Sputtering Targets

CAS Number: 10097-28-6

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Manganese Nitride ( MnN) Sputtering Targets

CAS Number: 10377-52-3

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Barium Bismuth Oxide (BBO) Sputtering Targets

CAS Number: 107539-20-8

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Aluminium Silicon Sputtering Target

CAS Number: 11145-27-0

Molecular Formula: AlSi

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Palladium (Pd) Sputtering Targets

CAS Number: 12002-99-2

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Iron Boron (Fe-B) Alloy Sputtering Targets

CAS Number: 12003-65-5

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Tungsten Titanium (W-Ti) Alloy Sputtering Targets

CAS Number: 12006-79-0

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Vanadium (V) Sputtering Targets

CAS Number: 12006-80-3

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Germanium Disulfide (GeS2) Sputtering Targets

CAS Number: 12006-84-7

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Lead Titanate (PbTiO3) Sputtering Targets

CAS Number: 12006-99-4

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Copper Sulfide (CuS) Sputtering Targets

CAS Number: 12007-01-1

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Nickel Niobium Titanium (Ni-Nb-Ti) Alloy Sputtering Targets

CAS Number: 12007-07-7

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Tungsten Sulfide (WS2) Sputtering Targets

CAS Number: 12007-16-8

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Gadolinium Nitride (GdN) Sputtering Targets

CAS Number: 12007-27-1

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Aluminum Oxide (Al2O3) Sputtering Targets

CAS Number: 12007-37-3

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Zinc (Zn) Sputtering Targets

CAS Number: 12007-38-4

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Gadolinium Zirconate (Gd2Zr2O3) Sputtering Targets

CAS Number: 12007-97-5

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Vanadium Silicide (V3Si) Sputtering Targets

CAS Number: 12008-02-5

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