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  • CVD Method Monolayer WS2
  • CVD Method Monolayer WS2

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    Catalog Number
    ACMA00018420
    Chemical Name
    CVD Method Monolayer WS2
    Category
    Other Nanomaterials
    Description
    The CVD method monolayer WS2 is a promising member of Alfa Chemistry's family of 2D graphene-like materials. Among 2D materials with tailored morphologies designed to enhance their performance in nanoelectronics, WS2 is a particularly promising candidate. Alfa Chemistry's high quality WS2 layer films can be used as CVD grown films on sapphire, Al2O3 or SiO2 substrates.
    Whatever your purpose, you will be impressed with the performance and consistent quality of the CVD method monolayer WS2 from us.
    Structure
    Molecular Weight
    247.98 g/mol
    Canonical SMILES
    S=[W]=S
    InChI
    InChI=1S/2S.W
    InChIKey
    ITRNXVSDJBHYNJ-UHFFFAOYSA-N
    Boiling Point
    1250 °C (2280 °F; 1520 K)
    Purity
    (6N) 99.9999% confirmed
    Appearance
    Transparent
    Application
    Potential applications include transistors, sensors, and other electronic and photovoltaic devices.
    Bandgap
    ~2.05 eV
    Diameter
    20-50 μm
    Dimension
    9 mm*9 mm
    Storage Conditions
    Room temperature and dry
    Thickness
    0.6-0.8 nm
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