Product Introduction:
Quantum dot (QD) concentrate for photoresists is a specialized nanomaterial formulation designed for advanced photolithography processes used in modern display manufacturing. By incorporating quantum dots into photoresist formulations, manufacturers can fabricate precisely patterned quantum dot color conversion layers, which are essential for next-generation display technologies.
The product is based on a sophisticated core–shell nanostructure in which a CdSe core is sequentially coated with ZnCdSeS alloy layers and a ZnS outer shell. The core–shell architecture significantly enhances photoluminescence efficiency while protecting the emissive core from environmental degradation. In addition, the surface of the QDs undergoes specialized modification treatment. This structural optimization enables the QDs to be uniformly dispersed within the photoresist material system while maintaining excellent optical performance during photolithography and subsequent processing steps.
QD concentrate for photoresists offers several important advantages that make it well suited for advanced optoelectronic fabrication processes. To begin with, the carefully engineered CdSe/ZnCdSeS/ZnS core–shell structure provides excellent photoluminescence efficiency, enabling bright and highly stable light emission. This strong optical performance ensures that the resulting patterned layers can deliver vivid colors and high brightness in display applications.
In addition, the material also demonstrates outstanding stability. The protective outer shell and optimized surface passivation help the quantum dots resist degradation caused by light, heat, and chemical environments typically encountered during photoresist processing. As a result, the optical properties remain consistent throughout fabrication and long-term device operation.
In addition to the advantages mentioned above, the product also exhibits excellent compatibility with photoresist systems. Through specialized surface modification, the quantum dots can be uniformly dispersed in photoresist formulations, minimizing aggregation and enabling smooth, homogeneous films. This improved dispersion behavior is particularly important for achieving precise photolithographic patterning and maintaining uniform emission across the fabricated structures.
By incorporating highly concentrated quantum dots into photoresist formulations, this material enables precise photopatterning of red, green, or other emissive regions with high resolution and excellent uniformity. It is widely applied in the manufacturing of quantum dot color conversion (QDCC) structures for displays such as quantum dot light-emitting diode (QLED), micro light-emitting diode (micro-LED), and other emerging optoelectronic devices. In addition, the use of QD concentrates helps improve process compatibility, film quality, and optical performance, supporting the development of high-brightness, wide-color-gamut, and high-efficiency display panels.
| Catalog Number | Color | PL Emission | FWHM | QY | Solvent | QD Concentration |
| NM-QD0329 | Blue | 450±2 nm | ≤25 nm | ≥80% | PGMEA | 20 wt% |
| NM-QD0330 | Green | 535±2 nm | ≤26 nm | ≥90% | PGMEA | 20 wt% |
| NM-QD0331 | Yellow | 575±2 nm | ≤26 nm | ≥90% | PGMEA | 20 wt% |
| NM-QD0332 | Red | 620±2 nm | ≤28 nm | ≥90% | PGMEA | 20 wt% |
Our products feature high photoluminescence efficiency, narrow emission bandwidth, and excellent stability, ensuring reliable performance during photolithography and device fabrication processes. In addition, we offer a wide range of emission wavelengths along with flexible formulation options, allowing our QD concentrates to be tailored to different photoresist systems, processing conditions, and display technologies. If you have specific requirements or are interested in customized solutions, please feel free to contact us.
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